▶ Photo Resist
Photo Resist
DTPR - 3000(Positive)
A
. High Sensitivity
B
. High Development Speed
C
. Long Run Press
D
. Good Leveling
DTPR - 2000(Positive)
A
. Good Sensitivity
B
. Good Development Speed
C
. Long Run Press
DTN - 100(Negative)
A
. High Sensitivity
B
. High Development Speed
C
. High Long Run Press
▶ Developer
Development Standard Condition
Specification
Harmony
(ctp thermal working)
Harmony
(Negative working)
Harmony
(Positive working)
Developing time
30 Sec
25 Sec
25 Sec
Allowable difference
±10 Sec
±5 Sec
±5 Sec
Developing temperature
25 °C
25 °C
25 °C
Allowable difference
±2 °C
±2 °C
±2 °C
Dilution
Undiluted
Undiluted
(DPD)1 : 6(Water)
▶ Other Chemicals
Name
Application
DIR
Image remover
DGS
Gum solution
DPC
Plate cleaner (emulsion type)
▶ Phoro-Resist Chemicals
Name
Application
DTPR-3000
Positive Photo-Resist
DTPR-2000
Positive Photo-Resist
DTN-100
Negative Photo-Resist
Casamia Bldg. 8FL. 890-2 Janghang-Dong, Ilsandong-Ku, Koyang-City, Kyungki-Do, Korea
Tel. 82-2-2603-5050 Fax. 82-2-2603-6747 Mobile. 82-17-747-6048
Email : dtopinc@yahoo.co.kr / seolinkr@chol.com
Copyright ⓒ 2005~2008 DTOP Inc. All Rights Reserved.
